Aluminum silicon (AlSi) sputtering targets are alloy target materials made from aluminum and silicon. They are used in physical vapor deposition (sputtering), where ions bombard the target surface and eject atoms that condense onto a substrate to form a thin film. As an alloy, AlSi combines the conductivity of aluminum with the properties contributed by silicon, making it a common choice for thin-film research.
- Quantity: 1 piece
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- Metallization and interconnect layers in microelectronics and semiconductor device research
- Thin-film deposition studies for electronic and optoelectronic components
- Protective and functional coatings on substrates in materials research
- Process development and optimization in vacuum deposition systems
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