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Aluminum Silicon Copper (AlSiCu) Sputtering Targets

Aluminum Silicon Copper (AlSiCu) Sputtering Targets
Regular price Rp 3.132.000,00
Regular price Sale price Rp 3.132.000,00
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Aluminum Silicon Copper (AlSiCu) is a metallic alloy in which small amounts of silicon and copper are added to aluminum. It is supplied as a sputtering target, a solid source material used in physical vapor deposition to form thin metal films on substrates. It belongs to the group of aluminum-based alloy materials used in thin-film research.

  • 1 piece

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  • Thin-film metallization studies for microelectronic interconnect research
  • Electrode and conductive layer development for MEMS and sensor devices
  • Deposition process optimization in academic and industrial thin-film laboratories
  • Surface and coating investigations for reflective or conductive films

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