This antimony (Sb) sputtering target from Nanografi is an elastomer-type target with 99.999% purity, a 2'' size and a thickness of 0.125''. It is intended for sputter deposition of thin antimony films onto substrates such as silicon wafers, as well as for sputter etching and surface analysis.
Sputter deposition works for many materials and substrate geometries, gives repeatable results and scales from small R&D runs to production batches covering medium to large areas. Its many process parameters give experienced users close control over film growth and microstructure.
Antimony is a bluish-white element with a shiny metallic lustre, atomic number 51, sitting in group 15 with arsenic and bismuth. Its strong fire-retardant behaviour makes it useful for fire retardant coatings, and it is also used in optoelectronic devices and as a dopant in n-type silicon.
- Thin film deposition of antimony onto substrates such as silicon wafers.
- Fire retardant coatings that exploit antimony's fire retardance.
- Thin films for optoelectronic devices such as LEDs, laser diodes, photodiodes and solar cells.
- Semiconductor work involving antimony as a dopant in n-type silicon for diodes, infrared detectors and Hall-effect devices.
- Sputter etching where high etching anisotropy is required.
- Compositional analysis by sputtering, as in secondary ion mass spectrometry (SIMS).
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AT10
- Material: Antimony (Sb)
- Type: Elastomer
- Size: 2''
- Thickness: 0.125''
- Atomic number: 51
- Product code: NG0ST01AT10
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