This antimony (Sb) sputtering target from Nanografi offers 99.999% purity in a 1'' size with a thickness of 0.125''. It serves as the source material for depositing antimony thin films by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Sputter deposition is a repeatable technique that works on substrates of many shapes and sizes and scales from small R&D work to production batches covering medium to large areas. Its many process parameters give experienced users close control over film growth and microstructure.
Antimony is a bluish-white, lustrous element with atomic number 51, sitting in group 15 alongside arsenic and bismuth. Its fire-retardant character makes it useful for fire retardant coatings, and it is increasingly used as a dopant in n-type silicon. Antimony can also be combined with elements such as tin or indium, for example in indium antimony oxide for transparent conductive films.
- Thin film deposition of antimony onto substrates such as silicon wafers.
- Fire retardant coatings that exploit antimony's fire retardance.
- Optoelectronic devices including LEDs, laser diodes, photodiodes and solar cells.
- Semiconductor work involving antimony as a dopant in n-type silicon for diodes, infrared detectors and Hall-effect devices.
- Sputter etching where high etching anisotropy is required.
- Surface composition analysis such as secondary ion mass spectroscopy (SIMS).
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AT08
- Material: Antimony (Sb)
- Size: 1''
- Thickness: 0.125''
- Atomic number: 51
- Product code: NG0ST01AT08
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