This antimony (Sb) sputtering target from Nanografi is a 99.999% purity disc, 1'' in size and 0.125'' thick, intended for depositing thin antimony films by sputtering. In this process, material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Sputter deposition is repeatable and works on substrates of many shapes and sizes, from small research and development runs up to production batches covering medium to large areas. Its many process parameters give experienced users close control over film growth and microstructure.
Antimony, atomic number 51, is a bluish-white element with a shiny metallic lustre in group 15 of the periodic table, alongside arsenic and bismuth. Its fire retardant character makes it useful for fire retardant coatings, and it is also used in optoelectronic devices and as a dopant in n-type silicon wafers. It can be combined with elements such as tin or indium, for example in indium antimony oxide for transparent conductive films.
- Thin film deposition of antimony onto substrates such as silicon wafers.
- Fire retardant coatings that draw on antimony's fire retardance.
- Optoelectronic devices including LEDs, laser diodes, photodiodes and solar cells.
- Semiconductor work involving antimony as a dopant in n-type silicon for diodes, infrared detectors and Hall-effect devices.
- Alloy and compound films with elements such as tin or indium, including transparent conductive films.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AT01
- Material: Antimony (Sb)
- Size: 1''
- Thickness: 0.125''
- Atomic number: 51
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