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Nanografi

Antimony (Sb) Sputtering Targets

Antimony (Sb) Sputtering Targets
Regular price Rp 8.705.000,00
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This antimony (Sb) sputtering target from Nanografi is a 2'' disc, 0.250'' thick, with a purity of 99.95%. It serves as the source material in sputter deposition, where atoms are eroded from the target and laid down as a thin film on a substrate such as a silicon wafer.

Sputter deposition is repeatable and scales from small R&D experiments up to production batches covering medium to large substrate areas. Its many process parameters give experienced users close control over film growth and microstructure.

Antimony is a bluish-white, lustrous metal with atomic number 51, sitting in group 15 alongside arsenic and bismuth. Its fire-retardant character makes it useful for flame-retardant coatings, and it is also applied in optoelectronic devices and as an n-type dopant in silicon. Antimony can be combined with elements such as tin or indium, for example in indium antimony oxide used to produce transparent conductive films.

  • Thin film deposition of antimony onto substrates such as silicon wafers.
  • Fire-retardant coatings based on antimony.
  • Optoelectronic devices including LEDs, laser diodes, photodiodes and solar cells.
  • Semiconductor work involving antimony as a dopant in n-type silicon for diodes, infrared detectors and Hall-effect devices.
  • Sputter etching where high etching anisotropy is required.
  • Surface analysis such as secondary ion mass spectrometry (SIMS).

Brand Nanografi
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Molecular formula —
Purity 99.95%
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Pack sizes 1 piece
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  • Product code: NG0ST01AT03
  • Material: Antimony (Sb)
  • Size: 2''
  • Thickness: 0.250''
  • Atomic number: 51
  • Product code: NG0ST01AT03

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