This antimony (Sb) sputtering target is a 99.999% pure source material for thin film deposition, supplied as a single piece measuring 3'' in size with a thickness of 0.125''. During sputtering, material is eroded from the target and deposited onto a substrate such as a silicon wafer, giving a repeatable process that scales from small R&D work to production batches covering medium to large substrate areas.
Antimony, atomic number 51, sits in group 15 of the periodic table alongside arsenic and bismuth. It is a bluish-white element with a shiny metallic lustre, and its chemistry closely resembles that of arsenic. Its strong fire retardance makes antimony targets suitable for fire retardant coatings.
Antimony films are also relevant to optoelectronic devices including LEDs, laser diodes, photodiodes and solar cells. In semiconductor work, antimony is increasingly used as a dopant in n-type silicon wafers for diodes, infrared detectors and Hall-effect devices, and it can be combined with elements such as tin or indium, for example in indium antimony oxide for transparent conductive films.
- Sputter deposition of antimony thin films onto substrates such as silicon wafers.
- Preparation of fire retardant coatings.
- Thin film work for optoelectronic devices such as LEDs, laser diodes, photodiodes and solar cells.
- Semiconductor research involving antimony as an n-type dopant for diodes, infrared detectors and Hall-effect devices.
- Sputter etching where high etching anisotropy is needed and selectivity is not a concern.
- Depth-profiling analysis such as secondary ion mass spectrometry (SIMS).
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01AT06
- Material: Antimony (Sb)
- Size: 3''
- Thickness: 0.125''
- Atomic number: 51
- Product code: NG0ST01AT06
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