This barium (Ba) sputtering target from Nanografi is a 1'' disc, 0.125'' thick, with a purity of 99.5%. It serves as the source material for depositing thin barium-containing films by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Barium (symbol Ba, atomic number 56, atomic weight 137.27) is an alkaline-earth metal in Block S, Group 2, Period 6. Its good electrical properties make it a suitable choice for coating electronic devices, semiconductor work and flat panel display production. Barium also forms alloys with metals such as strontium and titanium, which gives sputtered films more specific properties and has made it a frequent subject of research.
Sputter deposition is repeatable and scales from small R&D runs to production batches covering medium to large substrate areas. Its many process parameters give experienced users close control over film growth and microstructure.
- Thin film deposition of barium onto substrates such as silicon wafers.
- Plating and coating of electronic devices.
- Thin film layers for semiconductor applications.
- Film deposition for flat panel displays.
- Research on sputtered barium alloys with metals such as strontium and titanium.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.5% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BA01
- Material: Barium (Ba)
- Size: 1''
- Thickness: 0.125''
- Atomic number: 56
- Atomic weight: 137.27
- Element classification: Block S, Group 2, Period 6; alkaline-earth metal
- Product code: NG0ST01BA01
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