This barium (Ba) sputtering target from Nanografi is a 99.5% purity disc measuring 2'' across and 0.125'' thick, supplied as a single piece. It serves as the source material for depositing barium-containing thin films by sputtering onto substrates such as silicon wafers.
Barium is an alkaline-earth metal (atomic number 56, atomic weight 137.27) located in Block S, Group 2, Period 6 of the periodic table. Its good electrical properties make it suitable for sputtering work, including coating electronic devices and preparing layers for semiconductors and flat panel displays. Barium also forms alloys with metals such as strontium and titanium, which researchers use as sputtering targets when more specific film properties are required.
Sputter deposition is repeatable and can grow from small R&D experiments to production batches covering medium to large substrate areas. Its many process parameters give experienced users close control over film growth and microstructure.
- Thin film deposition of barium onto substrates such as silicon wafers.
- Plating and coating of electronic devices.
- Preparation of films for semiconductor applications.
- Thin film work for flat panel displays.
- Sputter etching where high etching anisotropy is needed and selectivity is not a concern.
- Research on barium and barium alloy films, such as those with strontium and titanium.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.5% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BA03
- Material: Barium (Ba)
- Size: 2''
- Thickness: 0.125''
- Atomic number: 56
- Atomic weight: 137.27
- Product code: NG0ST01BA03
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