This barium (Ba) sputtering target from Nanografi has a purity of 99.5%, a size of 2'' and a thickness of 0.250''. It serves as the source material for thin film deposition by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Barium (symbol Ba, atomic number 56, atomic weight 137.27) is an alkaline-earth metal in Block S, Group 2, Period 6 of the periodic table. Its good electrical properties make it suitable for sputtering, and it is used in the plating of electronic devices, in semiconductor work and in flat panel displays. Barium also forms alloys with metals such as strontium and titanium, which can give the deposited films more specific properties.
Sputtering is a repeatable process that scales from small research and development projects to production batches covering medium to large substrate areas. Its many process parameters give experienced users a high degree of control over film growth and microstructure.
- Thin film deposition onto substrates such as silicon wafers.
- Plating of electronic devices with barium layers.
- Semiconductor fabrication processes using barium films.
- Coating work for flat panel displays.
- Research on barium and its alloys with strontium or titanium as sputtering materials.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.5% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BA04
- Material: Barium (Ba)
- Size: 2''
- Thickness: 0.250''
- Atomic number: 56
- Atomic weight: 137.27
- Product code: NG0ST01BA04
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