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Nanografi

Barium (Ba) Sputtering Targets

Barium (Ba) Sputtering Targets
Regular price Rp 18.497.000,00
Regular price Sale price Rp 18.497.000,00
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Barium (Ba) is an alkaline earth metal. This barium sputtering target is a solid source material used in physical vapor deposition (PVD), a thin-film technique in which atoms are ejected from the target surface and deposited onto a substrate. It belongs to the metal sputtering target group commonly used in thin-film research and development.

  • 1 piece

For technical specifications, Certificate of Analysis (CoA), or a quotation, please contact AMI Scientific.

  • Deposition of barium-containing oxide thin films for ferroelectric and dielectric studies
  • Thin-film development for electronic and sensor device prototypes
  • Functional and optical coating research
  • Surface science and materials characterization studies

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