This barium (Ba) sputtering target is a 3'' disc, 0.125'' thick, with a purity of 99.5%. It serves as the source material for depositing barium-containing thin films by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Barium (atomic number 56, atomic weight 137.27) is an alkaline-earth metal in Group 2, Period 6 of the periodic table. Its good electrical properties make it suitable for sputtering work related to electronic devices, semiconductors and flat panel displays. Barium can also be alloyed with metals such as strontium and titanium to obtain more specific properties for sputtered films.
Sputter deposition is a repeatable process that can move from small R&D projects to production batches covering medium to large substrate areas. Its many process parameters give experienced users a high degree of control over film growth and microstructure.
- Thin film deposition of barium onto substrates such as silicon wafers.
- Coating and plating layers for electronic devices.
- Thin film work for semiconductor fabrication.
- Layer deposition for flat panel display development.
- Research on barium alloys with strontium or titanium for sputtered films.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.5% |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BA05
- Material: Barium (Ba)
- Size: 3''
- Thickness: 0.125''
- Atomic number: 56
- Atomic weight: 137.27
- Element classification: Alkaline-earth metal, Block S, Group 2, Period 6
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