Barium (Ba) sputtering targets are solid metal plates designed for physical vapor deposition (PVD) processes. In sputtering, ions bombard the target surface, ejecting barium atoms that condense onto a substrate to form thin films. Barium is an alkaline earth metal and a reactive element, so it is typically handled under controlled, dry or inert conditions to limit oxidation.
- Quantity: 1 piece
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- Research on thin films for oxide and ferroelectric materials
- Deposition of barium-containing layers in electronic device studies
- Surface and coating development in university and industrial laboratories
- Process development and optimization for sputter deposition systems
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