This Nanografi barium fluoride (BaF2) sputtering target is a 2'' disc, 0.250'' thick, with a purity of 99.99%. It serves as the source material in sputter deposition, where atoms are eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputter deposition works on substrates of many shapes and sizes and gives repeatable results. A process developed at research scale can be carried over to production batches covering medium to large substrate areas. Depending on the process parameters, chemical reactions may take place at the target surface, in flight or on the substrate, giving experienced users close control over film growth and microstructure.
Barium fluoride is a salt of barium and fluorine. It is a solid that can form transparent crystals, and it is associated with the 10 to 20µm infrared wavelength region.
- Deposition of barium fluoride thin films onto substrates such as silicon wafers.
- Sputter etching where strong etching anisotropy is required and selectivity is not critical.
- Material analysis by sputtering, as in secondary ion mass spectrometry (SIMS), to determine composition and detect very low impurity levels.
- Research related to infrared work in the 10 to 20µm wavelength region.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BA10
- Material: Barium Fluoride (BaF2)
- Size: 2''
- Thickness: 0.250''
- Product code: NG0ST01BA10
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