This barium strontium titanate (BST) sputtering target is an elastomer-bonded target with 99.99% purity, a 3'' size and a thickness of 0.250''. It serves as the source material for sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
BST is a solid solution of barium titanate (BaTiO3) and strontium titanate (SrTiO3). Sputtered BST films are valued for their high dielectric constant, tunability and low dielectric loss, which makes them attractive for ferroelectric thin film devices used in tunable microwave components such as delay lines, resonators, phase shifters and varactors.
Sputtering is a repeatable process that scales from small research projects to production batches covering medium to large substrate areas. Its many process parameters give experienced users considerable control over film growth and microstructure, and researchers study factors such as oxygen vacancies, film thickness, grain size, Ba/Sr ratio, doping, annealing and multilayer structures to improve tunability and reduce loss.
- Deposition of BST thin films with high dielectric constant and low dielectric loss onto substrates such as silicon wafers.
- Fabrication of ferroelectric thin film devices for tunable microwave components, including delay lines, resonators, phase shifters and varactors.
- Research into how film thickness, grain size, Ba/Sr ratio, oxygen vacancies and doping affect dielectric tunability.
- Development of multilayer BST structures and annealing studies aimed at higher tunability and lower loss.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BA23
- Material: Barium Strontium Titanate (BaO4SrTi)
- Bonding: Elastomer
- Size: 3''
- Thickness: 0.250''
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