This barium strontium titanate (BST) sputtering target, elastomer type, is a 4'' disc with a thickness of 0.125'' and a purity of 99.99%. It serves as the source material for depositing BST thin films by sputtering onto substrates such as silicon wafers.
BST is a solid solution of barium titanate (BaTiO 3) and strontium titanate (SrTiO 3). Sputtered BST films are valued for their high dielectric constant, tunability and low dielectric loss, which has made BST-based ferroelectric thin film devices widely studied for tunable microwave components including delay lines, resonators, phase shifters and varactors.
Sputter deposition is a repeatable process that scales from small R&D work to production batches covering medium to large substrate areas. Its many process parameters give experienced users considerable control over film growth and microstructure, supporting research into factors such as oxygen vacancies, film thickness, grain size, Ba/Sr ratio, doping, annealing and multilayer structures.
- Deposition of BST dielectric thin films onto substrates such as silicon wafers.
- Fabrication of tunable microwave devices such as delay lines, resonators, phase shifters and varactors.
- Research on ferroelectric thin films aiming for higher tunability and lower dielectric loss.
- Sputter etching where high etching anisotropy is needed and selectivity is not a concern.
- Compositional analysis such as secondary ion mass spectrometry (SIMS).
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BA24
- Material: Barium Strontium Titanate (BaO4SrTi)
- Type: Elastomer
- Size: 4''
- Thickness: 0.125''
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