This barium strontium titanate (BST) sputtering target is a 99.99% purity source material, 8'' in size and 0.125'' thick, supplied with an elastomer bond. It is intended for sputter deposition of BST thin films onto substrates such as silicon wafers.
BST is a solid solution of barium titanate (BaTiO3) and strontium titanate (SrTiO3). Sputtered BST films are valued for their high dielectric constant, tunability and low dielectric loss, which has made BST-based ferroelectric thin film devices widely studied for tunable microwave components including delay lines, resonators, phase shifters and varactors. Research on these films looks at factors such as oxygen vacancies, film thickness, grain size, Ba/Sr ratio, doping, high temperature annealing and multilayer structures.
Sputtering is a repeatable process that scales from small R&D work to production batches covering medium to large substrate areas, and its many process parameters give fine control over film growth and microstructure.
- Deposition of barium strontium titanate thin films on substrates such as silicon wafers.
- Fabrication of ferroelectric thin films for tunable microwave devices such as delay lines, resonators, phase shifters and varactors.
- Research into dielectric tunability as a function of film thickness, grain size, Ba/Sr ratio, doping and annealing.
- Development of multilayer BST structures aimed at higher tunability and lower dielectric loss.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BA28
- Material: Barium Strontium Titanate (BaO4SrTi)
- Size: 8''
- Thickness: 0.125''
- Bonding: Elastomer
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