This barium titanate (BaTiO3) sputtering target is a 1'' disc with a thickness of 0.250'' and a purity of 99.99%. It is used as the source material for depositing barium titanate thin films by sputtering, where material is eroded from the target and deposited onto a substrate such as a silicon wafer.
Barium titanate is an inorganic ferroelectric ceramic. It shows piezoelectric properties and the photorefractive effect. As a powder it is white, and large crystals are transparent. Films grown from this target are relevant to electronic ceramics and to the fabrication of devices such as capacitors, sensors and detectors.
Sputter deposition is repeatable and can move from small R&D work to production batches on medium to large substrate areas. Its many process parameters give experienced users a high degree of control over film growth and microstructure.
- Thin film deposition of barium titanate onto substrates such as silicon wafers.
- Producing barium titanate films for specialised electronic ceramics.
- Fabricating electronic devices such as capacitors, sensors and detectors.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BA31
- Material: Barium Titanate (BaTiO3)
- Size: 1''
- Thickness: 0.250''
- Product code: NG0ST01BA31
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