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Nanografi

Barium Titanate (BaTiO3) Sputtering Targets

Barium Titanate (BaTiO3) Sputtering Targets
Regular price Rp 22.909.000,00
Regular price Sale price Rp 22.909.000,00
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This barium titanate (BaTiO3) sputtering target is a 2'' diameter, 0.125'' thick disc with 99.99% purity, intended for thin film deposition by sputtering. Material eroded from the target is deposited onto a substrate such as a silicon wafer, and the process can be repeated reliably and scaled from small R&D work to production batches covering medium to large substrate areas.

Barium titanate is an inorganic ferroelectric ceramic. As a powder it is white, while large crystals are transparent. It shows piezoelectric properties and the photorefractive effect, which makes its sputtered films useful in electronic ceramics and in building devices such as capacitors, sensors and detectors.

Depending on process parameters, chemical reactions can take place on the target surface, in flight or on the substrate. The number of adjustable parameters makes sputter deposition complex, but it gives experienced users fine control over film growth and microstructure.

  • Deposition of barium titanate thin films on substrates such as silicon wafers by sputtering.
  • Production of ferroelectric films for electronic ceramics.
  • Fabrication of electronic devices including capacitors, sensors and detectors.
  • Sputter etching where high etching anisotropy is required and selectivity is not a concern.
  • Materials analysis methods such as secondary ion mass spectrometry (SIMS), where the target is sputtered at a constant rate to determine composition and trace impurities.

Brand Nanografi
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Purity 99.99%
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Pack sizes 1 piece
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  • Product code: NG0ST01BA32
  • Material: Barium Titanate (BaTiO3)
  • Size: 2''
  • Thickness: 0.125''
  • Product code: NG0ST01BA32

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