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Nanografi

Barium Titanate (BaTiO3) Sputtering Targets

Barium Titanate (BaTiO3) Sputtering Targets
Regular price Rp 28.366.000,00
Regular price Sale price Rp 28.366.000,00
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This barium titanate (BaTiO3) sputtering target from Nanografi is a 3'' diameter disc, 0.250'' thick, with a purity of 99.99%. It serves as the source material for sputter deposition of barium titanate thin films onto substrates such as silicon wafers.

Barium titanate is an inorganic ferroelectric ceramic. It shows piezoelectric behaviour and the photorefractive effect, which makes its films useful in electronic ceramics and in building devices such as capacitors, sensors and detectors.

Sputtering is a repeatable deposition method that scales from small R&D work to production batches covering medium to large substrate areas. Its many process parameters are what make it complex, but they also give the operator close control over film growth and microstructure.

  • Deposition of barium titanate thin films on substrates such as silicon wafers.
  • Fabrication of electronic ceramic films with ferroelectric and piezoelectric properties.
  • Assembly of electronic devices including capacitors, sensors and detectors.
  • Sputter etching where high etching anisotropy is required and selectivity is not a concern.
  • Compositional analysis such as secondary ion mass spectrometry (SIMS), where material is sputtered at a constant rate.

Brand Nanografi
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Molecular formula —
Purity 99.99%
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Pack sizes 1 piece
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  • Product code: NG0ST01BA35
  • Material: Barium Titanate (BaTiO3)
  • Size: 3''
  • Thickness: 0.250''
  • Product code: NG0ST01BA35

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