This barium titanate (BaTiO3) sputtering target is a 6'' piece, 0.250'' thick, with 99.99% purity, intended for depositing barium titanate thin films by sputtering. During sputter deposition, material is eroded from the target and transferred onto a substrate such as a silicon wafer.
Barium titanate is an inorganic ferroelectric ceramic that shows piezoelectric properties and the photorefractive effect. It is white in powder form and transparent as large crystals. Sputtered barium titanate films are used in specialised electronic ceramics and in building devices such as capacitors, sensors and detectors.
Sputtering is a repeatable process that works on substrates of many shapes and sizes and scales from small R&D work to medium and large production batches. Its many process parameters give experienced users a high degree of control over film growth and microstructure.
- Thin film deposition of barium titanate layers onto substrates such as silicon wafers.
- Production of barium titanate films for specialised electronic ceramics.
- Fabrication of electronic devices including capacitors, sensors and detectors.
- Research and development work that can later be scaled up to larger production batches.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BA41
- Material: Barium Titanate (BaTiO3)
- Size: 6''
- Thickness: 0.250''
- Product code: NG0ST01BA41
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