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Nanografi

Barium Titanate (BaTiO3) Sputtering Targets

Barium Titanate (BaTiO3) Sputtering Targets
Regular price Rp 88.745.000,00
Regular price Sale price Rp 88.745.000,00
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This barium titanate (BaTiO3) sputtering target from Nanografi is a source material for depositing thin films by sputtering. It has a purity of 99.99%, a size of 8'' and a thickness of 0.125'', and is supplied as a single piece.

Barium titanate is an inorganic ferroelectric ceramic. It shows piezoelectric behaviour and the photorefractive effect, which makes its thin films useful in electronic ceramics and in components such as capacitors, sensors and detectors.

In sputter deposition, material is eroded from the target and lands on a substrate such as a silicon wafer. The process is repeatable, works on substrates of many shapes and sizes, and can move from small R&D runs to production batches covering medium to large areas. Its many process parameters give experienced users close control over film growth and microstructure.

  • Deposition of barium titanate thin films onto substrates such as silicon wafers.
  • Preparation of films for specialised electronic ceramics.
  • Fabrication of electronic devices including capacitors, sensors and detectors.
  • Sputter etching where high etching anisotropy is required and selectivity is not a concern.

Brand Nanografi
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Molecular formula —
Purity 99.99%
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Pack sizes 1 piece
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  • Product code: NG0ST01BA42
  • Material: Barium Titanate (BaTiO3)
  • Size: 8''
  • Thickness: 0.125''
  • Product code: NG0ST01BA42

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