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Nanografi

Barium Zirconate (BaZrO3) Sputtering Targets

Barium Zirconate (BaZrO3) Sputtering Targets
Regular price Rp 36.766.000,00
Regular price Sale price Rp 36.766.000,00
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This Nanografi barium zirconate (BaZrO3) sputtering target is a 99.99% pure disc measuring 3'' across and 0.125'' thick, supplied as a single piece. Barium zirconate is an electroceramic, a ceramic valued mainly for its electrical behaviour, which makes the target suitable for semiconductor, display, optical and ferroelectric thin film work using physical vapor deposition (PVD) or chemical vapor deposition (CVD).

In sputter deposition, material is eroded from the target and lands on a substrate such as a silicon wafer, forming a thin film. The method works on substrates of many shapes and sizes, gives repeatable results, and scales from small R&D runs to production batches covering medium to large areas.

Depending on process settings, chemical reactions may take place at the target surface, during transit, or on the substrate. The large number of adjustable parameters makes sputtering complex, but it gives experienced users fine control over film growth and microstructure.

  • Deposition of barium zirconate thin films on substrates such as silicon wafers.
  • Semiconductor, display and optical coatings by PVD or CVD processes.
  • Fabrication of ferroelectric thin film layers.
  • Sputter etching where high etching anisotropy is required and selectivity is not a concern.

Brand Nanografi
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Purity 99.99%
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Pack sizes 1 piece
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  • Product code: NG0ST01BA52
  • Material: Barium Zirconate (BaZrO3)
  • Size: 3''
  • Thickness: 0.125''
  • Product code: NG0ST01BA52

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