This barium zirconate (BaZrO3) sputtering target from Nanografi is a 99.99% purity disc measuring 3'' in diameter and 0.250'' thick, supplied as a single piece. It serves as the source material for depositing barium zirconate thin films by sputtering.
Barium zirconate is an electroceramic, a ceramic valued mainly for its electrical behaviour. Targets of this compound are used in semiconductor work, chemical vapor deposition (CVD) and physical vapor deposition (PVD), as well as display, optical and ferroelectric applications.
Sputter deposition removes material from the target and transfers it onto a substrate such as a silicon wafer. The process is repeatable, scales from small R&D projects up to production batches on medium to large substrate areas, and its many adjustable parameters give close control over film growth and microstructure.
- Thin film deposition of barium zirconate onto substrates such as silicon wafers.
- Semiconductor processing, including sputter etching where high anisotropy is required.
- Physical vapor deposition (PVD) and chemical vapor deposition (CVD) processes.
- Display and optical coating applications.
- Ferroelectric device and materials research.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BA53
- Material: Barium Zirconate (BaZrO3)
- Size: 3''
- Thickness: 0.250''
- Product code: NG0ST01BA53
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