Bismuth (Bi) sputtering targets are solid metallic sources designed for physical vapor deposition (PVD) processes. Bismuth is a heavy post-transition metal, and sputtering targets made from this element are used to deposit bismuth-based thin films onto substrates in research and development settings. During sputtering, energetic ions bombard the target surface, releasing atoms that condense onto the substrate to form a uniform layer.
- 1 piece
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- Thin-film deposition research on bismuth-containing layers
- Thermoelectric and energy-conversion film studies
- Development of electronic and semiconductor device layers
- Fundamental materials science and surface coating experiments
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