This bismuth ferrite (BiFeO3) sputtering target from Nanografi is a 6'' disc, 0.125'' thick, with 99.9% purity. It serves as the source material for depositing BiFeO3 thin films by sputtering, a repeatable method that works on substrates of many shapes and sizes and scales from small R&D runs to medium and large production batches.
BiFeO3 is an inorganic perovskite compound and one of the most promising multiferroic materials. The target is typically produced by high temperature sintering or recrystallization of a mixture of bismuth and iron oxides, giving a single-phase material. Indium bonding is recommended for this target.
As a lead-free ferroelectric, bismuth ferrite offers large remnant polarization, a high Curie temperature and a high antiferromagnetic Neel temperature, and it may be the only material showing both magnetic and ferroelectric behaviour at and above room temperature. With a direct band gap of 3.3 eV, well-prepared films are well suited to studying the ferroelectric photovoltaic effect.
- Thin film deposition of BiFeO3 onto substrates such as silicon wafers.
- Research on multiferroic and lead-free ferroelectric thin films.
- Studies of polarization-induced ferroelectric photovoltaic effects in bismuth ferrite films.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Surface analysis methods such as secondary ion mass spectrometry (SIMS).
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | BiFeO3 |
| Purity | 99.9% |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BI30
- Size: 6''
- Thickness: 0.125''
- Structure: Perovskite
- Band gap: 3.3 eV (direct)
- Recommended bonding: Indium bonding
- Product code: NG0ST01BI30
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