This bismuth ferrite (BiFeO3) sputtering target is a 99.9% purity disc measuring 7'' across and 0.125'' thick, intended for thin film deposition by sputtering. Sputtering is a repeatable technique that works on substrates of many shapes and sizes and scales from small R&D work to production batches covering medium to large areas.
BiFeO3 is an inorganic perovskite compound and a leading multiferroic material. The target is typically produced by high-temperature sintering or recrystallization of a Bi and Fe oxide mixture, giving a single-phase material. Indium bonding is recommended for this target.
As a lead-free ferroelectric, bismuth ferrite offers large remnant polarization, a high Curie temperature and a high antiferromagnetic Neel temperature, and it shows both magnetic and ferroelectric behaviour at and above room temperature. Its direct band gap of 3.3 eV and strong polarization have drawn interest in ferroelectric photovoltaic research, where well-prepared BiFeO3 films are especially suitable.
- Sputter deposition of multiferroic BiFeO3 thin films onto substrates such as silicon wafers.
- Preparation of lead-free ferroelectric films for research on the ferroelectric photovoltaic effect.
- Sputter etching processes where high etching anisotropy is required.
- Studies of materials combining magnetic and ferroelectric properties at room temperature.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BI32
- Material: Bismuth Ferrite (BiFeO3)
- Size: 7''
- Thickness: 0.125''
- Structure: Perovskite
- Band gap: 3.3 eV (direct)
- Recommended bonding: Indium bonding
- Product code: NG0ST01BI32
Indium bonding is recommended when mounting bismuth ferrite sputtering targets.
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