Bismuth oxide (Bi2O3) sputtering targets are dense inorganic oxide ceramic plates used as source material in physical vapor deposition. During sputtering, the target is bombarded with energetic ions so that bismuth oxide is ejected and deposited as a thin film onto a substrate. This makes the material a common choice for researchers working on oxide thin-film coatings.
- Quantity: 1 piece
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- Deposition of bismuth-based oxide thin films for optical and dielectric coating research
- Fabrication of thin-film layers for electronic and sensor device prototyping
- Studies of oxide thin films for photocatalytic and functional surface research
- Process development and deposition parameter optimization in university and industrial laboratories
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