This bismuth oxide (Bi2O3) sputtering target from Nanografi is a 99.9% purity disc measuring 2'' in size and 0.125'' thick, supplied as a single piece for thin film deposition. Sputter deposition works by eroding material from the target onto a substrate such as a silicon wafer, and the process can be repeated reliably and scaled from small R&D work to production batches covering medium to large substrate areas.
Bi2O3 is among the most significant bismuth compounds and has been widely studied for its optical and electrical behaviour, including an energy gap of 2 to 4 eV, a high refractive index, high electric permittivity, photoluminescence and high oxygen ion conductivity at medium and high temperatures. It exists in α, β, γ and δ polymorphs; only the low temperature monoclinic α-phase and the high temperature face-centered cubic δ-phase are stable.
Magnetron sputtering is a common route for these films, offering high deposition rates and dense, strongly adhering layers with access to commercial large area systems.
- Deposition of bismuth oxide thin films for optoelectronic devices and solar cells.
- Research on electrolyte layers for solid oxide fuel cells (SOFCs) and oxygen sensors.
- Fabrication of gas sensors and optical layers that use the high refractive index of Bi2O3.
- Studies of visible light photocatalysis for water dissociation and decontamination.
- Thin film work for microelectronics exploiting the high charge carrier mobility of bismuth-containing oxides.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BI41
- Material: Bismuth Oxide (Bi2O3)
- Size: 2''
- Thickness: 0.125''
- Energy gap: 2 to 4 eV
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