Bismuth oxide (Bi2O3) sputtering targets are dense ceramic sources of bismuth oxide, an inorganic metal oxide. They are used in physical vapor deposition (PVD) processes, where ion bombardment ejects material from the target to form a thin film on a substrate. Bi2O3 is of interest in thin film research because of its optical and electronic properties.
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- Thin film deposition research for optical coatings
- Development of dielectric and electronic thin layers
- Gas sensor and functional oxide film studies
- Photocatalytic and energy materials research on oxide films
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