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Bismuth Oxide (Bi2O3) Sputtering Targets

Bismuth Oxide (Bi2O3) Sputtering Targets
Regular price Rp 27.786.000,00
Regular price Sale price Rp 27.786.000,00
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Bismuth oxide (Bi2O3) sputtering targets are solid ceramic source materials made from an inorganic metal oxide. They are used in physical vapor deposition (PVD) processes, where sputtering transfers material from the target onto a substrate to form a thin film. Bismuth oxide belongs to the family of oxide ceramics studied for their optical, dielectric, and electronic properties.

  • 1 piece

For technical specifications, CoA, or quotation, please contact AMI Scientific.

  • Deposition of thin films for optical coating research
  • Investigation of dielectric and electronic thin-film layers
  • Prototyping of functional oxide layers for electronic devices
  • Development of sensor and photonic thin-film structures

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