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Nanografi

Bismuth Telluride (Bi2Te3) Sputtering Targets

Bismuth Telluride (Bi2Te3) Sputtering Targets
Regular price Rp 32.702.000,00
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This Nanografi bismuth telluride (Bi2Te3) sputtering target is a 99.999% pure source for depositing thin films by sputtering. Each target measures 2'' across with a thickness of 0.125'', and it is supplied as a single piece.

Bismuth telluride is a compound of bismuth and tellurium and behaves as a semiconductor. Alloyed with antimony or selenium, it becomes an efficient thermoelectric material used for refrigeration and portable power generation. It is also a topological insulator, so its physical properties depend on thickness.

Bi2Te3-based alloys are the leading semiconductor materials for bulk thermoelectric devices operating near room temperature. Nanostructured thin films of these alloys are drawing strong research interest, as well-ordered film structures can deliver higher thermoelectric efficiency than bulk material. Sputtering gives a repeatable route to such films that can be scaled from small R&D work to production batches on medium to large substrates, while its many process parameters allow close control over film growth and microstructure.

  • Sputter deposition of bismuth telluride thin films onto substrates such as silicon wafers.
  • Research on thin film thermoelectric materials for chip-scale micro-coolers used in thermal management of high-powered micro/nano-electronics.
  • Development of flexible micro-power generators for energy harvesting.
  • Studies of how composition, microstructure, morphology, thickness and substrate conditions affect thermoelectric properties of thin films.
  • Sputter etching where high etching anisotropy is required.

Brand Nanografi
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Molecular formula —
Purity 99.999%
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Pack sizes 1 piece
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  • Product code: NG0ST01BI59
  • Material: Bismuth Telluride (Bi2Te3)
  • Size: 2''
  • Thickness: 0.125''
  • Product code: NG0ST01BI59

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