Boron (B) sputtering targets are solid source materials used in physical vapor deposition (PVD) to produce thin films. Boron is a metalloid element, and this product is listed in Nanografi's nanomaterial category, supplied for research and laboratory thin-film work. During sputtering, energetic ions eject atoms from the target surface, which then condense onto a substrate to form a controlled coating.
- Quantity: 1 piece
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- Thin-film deposition research for semiconductor and electronic device development
- Development of boron-containing coatings and doped layers
- Surface engineering and protective coating studies
- Optical and functional thin-film research in university and industrial laboratories
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