This listing is for a boron (B) sputtering target, a solid source material used in physical vapor deposition (PVD) to form thin films. Boron is a metalloid element, and sputtering targets of this type are used in vacuum deposition systems to supply material for coating substrates. The product title also references indium, which may relate to the target's bonding or backing configuration. Please confirm the exact composition and construction with AMI Scientific before ordering.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, the Certificate of Analysis (CoA), or a quotation.
- Thin-film deposition research on semiconductor and electronic device structures
- Boron-containing coatings for surface and materials science studies
- Process development in magnetron sputtering systems
- Academic and industrial laboratory coating experiments
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