Boron (B) sputtering targets are solid source materials used in physical vapor deposition (PVD) to produce thin films on substrates. Listed under the Nanografi nanomaterial category, this boron target is an inorganic material and is offered with indium as noted in the product title. Confirm the exact composition and form with AMI Scientific before use.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a quotation.
- Thin-film deposition research using magnetron sputtering systems
- Process development for semiconductor and electronic device layers
- Protective and functional coating studies
- Materials research on boron-based thin films
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