Boron (B) sputtering targets are solid source materials used in physical vapor deposition (PVD) and sputtering systems to deposit boron-based thin films onto substrates. Boron is a metalloid element, and these targets are supplied under the Nanografi nanomaterial category. They provide a controlled source of boron for laboratory-scale thin-film research and development.
- Quantity: 1 piece
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- Thin-film deposition research for semiconductor and electronic device development
- Boron-doped layer fabrication in materials science studies
- Hard and protective coating research for surface engineering
- Fundamental studies of boron-containing thin films in academic laboratories
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