Boron (B) is a metalloid element widely used in materials science and thin film research. Boron sputtering targets are solid source materials designed for physical vapor deposition (PVD), where atoms are ejected from the target surface and deposited onto a substrate to form a thin layer.
- 1 piece
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- Thin film deposition for semiconductor device research
- Development of hard and protective coatings
- Boron-containing functional layers for optical and electronic studies
- Surface engineering experiments in university and industrial laboratories
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