Boron (B) sputtering targets are solid, high-purity source plates made from elemental boron, a metalloid element. In physical vapor deposition (PVD), a sputtering target is bombarded with energetic ions in a vacuum chamber, which ejects atoms that condense onto a substrate to form a thin film. Boron targets are used to deposit boron-containing films for research in electronics, coatings, and nuclear-related materials.
- Quantity: 1 piece
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- Deposition of boron-doped layers for semiconductor and microelectronics research
- Development of hard and wear-resistant protective thin films
- Fabrication of boron-based films for neutron detection research
- Materials science studies of boron compounds in thin-film form
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