Boron Carbide (B4C) sputtering targets are solid, sputter-ready ceramic sources made from boron carbide, a covalently bonded compound of boron and carbon. It belongs to the advanced ceramics and hard materials group, valued in materials research for its hardness and chemical stability. These targets serve as the source material in physical vapor deposition (PVD) processes, where the target is bombarded with energetic ions so that its material is deposited onto a substrate as a thin film.
- Quantity: 1 piece
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- Research on hard, wear-resistant protective thin-film coatings
- Studies of neutron absorption and shielding materials
- Thin-film deposition development for electronic and semiconductor devices
- Materials science investigations of ceramic coating structure and performance
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