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Boron Carbide (B4C) Sputtering Targets

Boron Carbide (B4C) Sputtering Targets
Regular price Rp 22.406.000,00
Regular price Sale price Rp 22.406.000,00
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Boron carbide (B4C) is an advanced covalent non-oxide ceramic, valued in materials research for its hardness and low density. This sputtering target serves as the source material for physical vapor deposition (PVD), where it is used to deposit boron carbide thin films onto substrates in laboratory and development settings.

  • Quantity: 1 piece

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  • Research on hard, wear-resistant protective thin-film coatings
  • Development of neutron-absorbing coatings and layers
  • Thin-film studies for semiconductor and MEMS device structures
  • Surface engineering research on advanced ceramic films

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