Boron nitride (BN) is a ceramic compound of boron and nitrogen, belonging to the group of advanced ceramics and inorganic compounds. Boron nitride sputtering targets are solid source materials used in physical vapor deposition (PVD), where the target is bombarded with energetic ions so that its material is deposited as a thin film onto a substrate.
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- Deposition of thin dielectric and insulating layers in electronics and semiconductor research
- Development of protective and hard coatings for surface engineering studies
- Research on optical and high-temperature coating layers
- Investigation of interlayers and barrier films in thin film device structures
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