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Boron Nitride (BN) Sputtering Targets

Boron Nitride (BN) Sputtering Targets
Regular price Rp 16.988.000,00
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Boron nitride (BN) is an advanced ceramic compound of boron and nitrogen, known for its layered hexagonal structure and its cubic form. As a sputtering target, it serves as the source material for physical vapor deposition, where atoms are ejected and deposited onto a substrate to form thin films. It belongs to the category of advanced ceramic targets used in thin-film research.

  • Quantity: 1 piece

For technical specifications, CoA, or a quotation, please contact AMI Scientific.

  • Deposition of insulating and dielectric thin films in electronics research
  • Studies of protective and wear-resistant coatings
  • Growth and characterization of two-dimensional hexagonal boron nitride layers
  • Development of optical and dielectric coatings

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