Boron nitride (BN) is an advanced ceramic compound of boron and nitrogen, valued for its electrical insulation, thermal stability, and chemical inertness. It belongs to the nanomaterial and advanced ceramics group. Sputtering targets are solid source blocks used in physical vapor deposition (PVD) to deposit thin films of the material onto substrates in a controlled vacuum process.
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- Deposition of dielectric and insulating thin films for electronic device research
- Protective and wear-resistant coatings studied in materials engineering
- Thin-film development for optoelectronic and high-temperature component research
- Surface modification experiments in university and industrial laboratories
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