This boron nitride (BN) sputtering target is a 3'' disc, 0.250'' thick, with 99.5% purity. It serves as the source material for depositing BN thin films by sputtering, a physical vapor deposition (PVD) method that works at relatively low coating temperatures and can coat sharp edges, complex shapes and very thin layers.
Boron nitride is a refractory compound of boron and nitrogen known for resistance to heat and chemicals. Its hexagonal form (h-BN) is soft, lubricating and electrically insulating yet thermally conductive, while the cubic form (c-BN) is second only to diamond in hardness and outperforms diamond in stability against oxygen and ferrous materials at high temperatures.
Sputtering gives a repeatable process that scales from small research projects to production batches on medium to large substrates. Its many process parameters give users fine control over film growth and microstructure, which makes BN targets useful for work on cutting tool, protective, optical and insulating coatings.
- Deposition of boron nitride thin films onto substrates such as silicon wafers by sputtering.
- Research on cubic boron nitride (c-BN) coatings for cutting tools used in dry cutting, high speed machining and machining of hard materials.
- Production of protective and wear-resistant BN coatings.
- Deposition of optical coatings and electrically insulating layers.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | BN |
| Purity | 99.5% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01BO27
- Material: Boron Nitride (BN)
- Size: 3''
- Thickness: 0.250''
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