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Boron Nitride (BN) Sputtering Targets

Boron Nitride (BN) Sputtering Targets
Regular price Rp 30.689.000,00
Regular price Sale price Rp 30.689.000,00
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Boron nitride (BN) is a ceramic compound of boron and nitrogen, widely studied for its electrical insulation, thermal stability, and chemical inertness. This sputtering target is a solid source material used in physical vapor deposition (PVD) to deposit boron nitride thin films onto substrates in research and development settings.

  • Quantity: 1 piece

For technical specifications, Certificate of Analysis (CoA), or quotations, please contact AMI Scientific.

  • Insulating and dielectric thin layers in electronic device research
  • Protective and wear-resistant coatings studied in tribology
  • Thermal management layers for heat-spreading research
  • Deposition of two-dimensional and layered material heterostructures

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