This calcium manganate (CaMnO3) sputtering target is a 99.9% purity source material for depositing thin films by sputtering. Each piece measures 4'' in size with a thickness of 0.125''.
In sputter deposition, material is eroded from the target and transferred onto a substrate such as a silicon wafer. The method can coat substrates of many shapes and sizes, gives repeatable results, and scales from small research and development work to production batches covering medium to large substrate areas.
Depending on process settings, chemical reactions may take place at the target surface, in flight, or on the substrate. Although the number of adjustable parameters makes sputtering a complex technique, it gives experienced users considerable control over film growth and microstructure.
- Thin film deposition onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching, as in secondary ion mass spectroscopy (SIMS), to determine composition and detect very low impurity levels.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST02CA12
- Material: Calcium Manganate (CaMnO3)
- Size: 4''
- Thickness: 0.125''
- Product code: NG0ST02CA12
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