This calcium manganate (CaMnO3) sputtering target is a 99.9% purity source material, 4'' in size and 0.250'' thick, intended for depositing thin films by sputtering in research and production systems.
In sputter deposition, material is eroded from the target and deposited onto a substrate such as a silicon wafer. The method works on substrates of many shapes and sizes, gives repeatable results and can be scaled from small R&D work up to batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place at the target surface, in flight or on the substrate. The number of adjustable parameters makes sputtering a complex technique, but it gives experienced users fine control over film growth and microstructure.
- Thin film deposition onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not critical.
- Material analysis by etching, for example in secondary ion mass spectroscopy (SIMS) to determine composition and detect trace impurities.
- Studies related to space weathering processes on airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST02CA13
- Material: Calcium Manganate (CaMnO3)
- Size: 4''
- Thickness: 0.250''
- Product code: NG0ST02CA13
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