Carbon (C) graphite sputtering targets are solid, disc-shaped source materials used in physical vapor deposition (PVD) to produce thin carbon films on substrates. Graphite is a crystalline allotrope of carbon, valued for its layered structure, electrical conductivity, and chemical stability. As a sputtering target, it is bombarded with energetic ions in a vacuum chamber, releasing carbon atoms that condense onto a substrate to form a uniform coating. This material belongs to the carbon-based nanomaterial and thin-film source category.
- Quantity: 1 piece
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- Deposition of carbon thin films for electronic and semiconductor device research
- Fabrication of conductive carbon layers for electrode and sensor studies
- Protective and functional carbon coatings for optical and mechanical surfaces
- Academic research on carbon-based thin films and deposition processes
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