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Nanografi

Carbon (C) (Graphite) Sputtering Targets

Carbon (C) (Graphite) Sputtering Targets
Regular price Rp 9.982.000,00
Regular price Sale price Rp 9.982.000,00
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Carbon (graphite) sputtering targets are solid, dense source materials used in physical vapor deposition (PVD) processes. Classified among carbon-based nanomaterials and thin-film source materials, the target is bombarded with energetic ions in a vacuum chamber, ejecting carbon atoms that condense onto a substrate as a thin film. Graphite targets are commonly used in research laboratories developing carbon-based coatings and functional layers.

  • Quantity: 1 piece

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  • Deposition of carbon thin films for research on protective and wear-resistant coatings
  • Fabrication of carbon-based conductive layers and electrodes for electronic device studies
  • Preparation of carbon barrier layers and interlayers in multilayer thin-film stacks
  • Sample preparation for surface and materials characterization studies

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