This Nanografi sputtering target is made of carbon in the form of pyrolytic graphite, with a purity of 99.999%. It measures 1'' in size and 0.125'' in thickness and is supplied as a single piece for use as the source material in sputter deposition systems.
During sputtering, material is eroded from the target and deposited as a thin film onto a substrate, such as a silicon wafer. The technique works with substrates of many shapes and sizes, gives repeatable results, and can move from small research and development work to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place at the target surface, in flight, or on the substrate. Although these many variables make sputter deposition a complex process, they give experienced users considerable control over film growth and microstructure.
- Deposition of thin carbon films onto substrates such as silicon wafers.
- Sputter etching where a high degree of etching anisotropy is required and selectivity is not a concern.
- Material analysis by etching, as in secondary ion mass spectrometry (SIMS), where sputtered atoms are measured to determine composition and detect very low impurity levels.
- Research related to space weathering, a sputtering process that alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST02CA26
- Material: Carbon (C) (Pyrolytic Graphite)
- Size: 1''
- Thickness: 0.125''
- Product code: NG0ST02CA26
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