Carbon (C) sputtering targets are solid source materials used in physical vapor deposition (PVD) to deposit thin films of carbon-based material onto substrates. Carbon is a non-metallic element that can form several structures, from graphitic to amorphous, depending on the deposition process and conditions. The product title also references indium, so composition details, including any additional element, should be confirmed with AMI Scientific before use.
- Quantity: 1 piece
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- Thin-film research on carbon coatings for protective layers
- Electrode and conductive layer studies in electronic device development
- Optical and surface-modification coatings in materials science
- Fabrication of carbon-based films for laboratory deposition experiments
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